POSSIBLE STABILIZATION OF AMORPHOUS FENI FILMS BY CONDUCTION ELECTRONS

被引：2

作者：

BOSTANJOGLO, O

HEINECKE, U

LIEDTKE, R

机构：

[1] Optisches Institut, Technischen Universität Berlin

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1979年 / 56卷 / 02期

关键词：

D O I：

10.1002/pssa.2210560222

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Growth stress and structure factor of amorphous FexNi1−x films are determined in the range 0.4 ≦ x ≦ 1. The stress σ is tensile and proportional to thickness t (σ/t ≈ 1 × 1016 N/m3). The structure factors coincide in shape with those of amorphous 3d elements. Their value at the pronounced diffraction maximum markedly depends on x and scales with the stability of the amorphous state. These results provide evidence that conduction electrons decisively stabilize the amorphous state of FexNi1−x films. Copyright © 1979 WILEY‐VCH Verlag GmbH & Co. KGaA

引用

页码：569 / 572

页数：4

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