EVALUATION OF DC-PLASMA JET CHEMICAL-VAPOR-DEPOSITION FOR DIAMOND COATINGS ON TUNGSTEN CARBIDE-BASED CUTTING PLATES

被引：3

作者：

LUGSCHEIDER, E

MULLER, U

机构：

[1] Materials Science Institute, RWTH Aachen

来源：

关键词：

D O I：

10.1016/0925-9635(93)90013-R

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The aim of this work was to determine the influence of different surface preparations of cutting tool inserts on the diamond crystal nucleation density. Another point of investigation was the relationship of crystal orientation and the coating temperature. The d.c.-plasma jet chemical vapour deposition process was used for making all diamond films. One result was that it was possible to increase the size of the diamond particles using different types of grinding processes. Another result showed that the diamond orientation depends on the substrate temperature.

引用

页码：1464 / 1466

页数：3