INSITU REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION OBSERVATION DURING GROWTH OF YBA2CU3O7-X THIN-FILMS BY ACTIVATED REACTIVE EVAPORATION

被引:58
作者
TERASHIMA, T
IIJIMA, K
YAMAMOTO, K
HIRATA, K
BANDO, Y
TAKADA, T
机构
[1] RES INST PROD DEV,KYOTO 606,JAPAN
[2] OKAYAMA UNIV SCI,OKAYAMA 700,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1989年 / 28卷 / 06期
关键词
D O I
10.1143/JJAP.28.L987
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L987 / L990
页数:4
相关论文
共 12 条
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