INTERFERENCE MICROSCOPY ON THIN DIBLOCK COPOLYMER FILMS

被引:130
作者
COULON, G [1 ]
AUSSERRE, D [1 ]
RUSSELL, TP [1 ]
机构
[1] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120
来源
JOURNAL DE PHYSIQUE | 1990年 / 51卷 / 08期
关键词
D O I
10.1051/jphys:01990005108077700
中图分类号
学科分类号
摘要
At equilibrium thin films of symmetric diblock copolymers exhibit a morphology where the lamellar microdomains are oriented parallel to the external surfaces. Interference microscopy has been used to investigate this orientation which results in a quantization of the film thickness. Solution cast films of the symmetric polystyrene/polymethylmethacrylate P(S-b-MMA) diblock copolymers exhibit a single interference color characteristic of a film of uniform thickness with a free surface that is flat and smooth. Interference microscopy on these films annealed at 170°C for 24 hours and more shows the development of two distinct interference colors. The variations in the colors are discrete rather than continuous indicating step discontinuities in the film thickness with a height equal to one period of the underlying oriented lamellar multilayer.
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页码:777 / 786
页数:10
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