PROPERTIES AND APPLICATIONS OF ELECTRON-CYCLOTRON PLASMA-DEPOSITED SIOXNY FILMS WITH GRADED REFRACTIVE-INDEX PROFILES

被引：25

作者：

BULKIN, PV ^{[1
]}

SWART, PL ^{[1
]}

LACQUET, BM ^{[1
]}

机构：

[1] RAND AFRIKAANS UNIV,MAT LAB,SENSORS SOURCES & SIGNAL PROC RES GRP,JOHANNESBURG 2006,SOUTH AFRICA

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1995年 / 187卷

关键词：

D O I：

10.1016/0022-3093(95)00181-6

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In the experiments in the present study, electron cyclotron resonance plasma enhanced chemical vapour deposition was used for the deposition of SiOxNy films from O-2/Ar, N-2 and SiH4/Ar mixtures. Optical properties of the films were studied by means of transmission spectroscopy in the wavelength range 200-2600 nm. Refractive indices ranged between 1.5 and 3.5 (measured at 632.8 nm) for different film compositions. The extinction coefficient showed a strong blue shift with decrease of silane content in the gas mixture. Optical interference filters with continuously varying refractive index profiles were designed, and manufactured by our computer controlled electron cyclotron resonance system. Designs which take into account dispersion of refractive index, and absorption in the constituent SiOxNy material, differ only significantly from designs in which it is neglected at wavelengths shorter than 700 nm.

引用

页码：484 / 488

页数：5

共 12 条

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