STRESS IN FILMS OF SILICON MONOXIDE

[1] Behrndt K., 1962, VACUUM, V12, P1, DOI [10.1016/0042-207X(62)90818-7, DOI 10.1016/0042-207X(62)90818-7]

[2] BLACKBURN H, 1962, 8TH VAC S 2ND INT C, V2, P943

[3] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[4] BROWN DAH, 1950, TRE384 MEM

[5] PREPARATION, STRUCTURE, AND APPLICATIONS OF THIN FILMS OF SILICON MONOXIDE AND TITANIUM DIOXIDE [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1950, 33 (12) : 353 - 360

[6] ANNEALING SILICON MONOXIDE FILMS ON ALUMINIUM MIRRORS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1960, 11 (04): : 167 - 168

[7] HOLLAND L, 1961, BRIT J APPL PHYS, V12, P581

[8] ELECTRICAL CONDUCTIVITY IN EVAPORATED SILICON OXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) : 499 - &

[9] EIN EINFACHER UND SCHNELLER WEG ZUM ULTRAHOCHVAKUUM [J]. NATURWISSENSCHAFTEN, 1961, 48 (16) : 548 - &

[10] THE ORIGIN OF STRESS IN METAL LAYERS CONDENSED FROM THE VAPOUR IN HIGH VACUUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (407): : 905 - 910

[1] Behrndt K., 1962, VACUUM, V12, P1, DOI [10.1016/0042-207X(62)90818-7, DOI 10.1016/0042-207X(62)90818-7]

[2] BLACKBURN H, 1962, 8TH VAC S 2ND INT C, V2, P943

[3] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[4] BROWN DAH, 1950, TRE384 MEM

[5] PREPARATION, STRUCTURE, AND APPLICATIONS OF THIN FILMS OF SILICON MONOXIDE AND TITANIUM DIOXIDE [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1950, 33 (12) : 353 - 360

[6] ANNEALING SILICON MONOXIDE FILMS ON ALUMINIUM MIRRORS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1960, 11 (04): : 167 - 168

[7] HOLLAND L, 1961, BRIT J APPL PHYS, V12, P581

[8] ELECTRICAL CONDUCTIVITY IN EVAPORATED SILICON OXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) : 499 - &

[9] EIN EINFACHER UND SCHNELLER WEG ZUM ULTRAHOCHVAKUUM [J]. NATURWISSENSCHAFTEN, 1961, 48 (16) : 548 - &

[10] THE ORIGIN OF STRESS IN METAL LAYERS CONDENSED FROM THE VAPOUR IN HIGH VACUUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (407): : 905 - 910