RECENT DEVELOPMENTS IN MONITORING AND CONTROLLING TECHNIQUES FOR ALLOY DEPOSITION PROCESSES

被引：2

作者：

LU, C ^{[1
]}

机构：

[1] INFICON LEYBOLD HERAEUS INC,WESTERN OPERAT,SAN JOSE,CA 95112

来源：

THIN SOLID FILMS | 1977年 / 45卷 / 03期

关键词：

D O I：

10.1016/0040-6090(77)90235-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：481 / 490

页数：10

共 27 条

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[2]

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[8] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITED FILM THICKNESS [J].

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[9] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR ANALYSIS OF THIN-FILMS [J].

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[10] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MICROVOLUME ELEMENTAL ANALYSIS [J].

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JOURNAL OF APPLIED PHYSICS, 1975, 46 (06) :2701-2709

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