DEPOSITION OF THIN-FILMS BY DECOMPOSITION OF TETRA-ETHOXY SILANE IN A RADIO-FREQUENCY GLOW-DISCHARGE

被引：101

作者：

MUKHERJEE, SP ^{[1
]}

EVANS, PE ^{[1
]}

机构：

[1] UNIV MANCHESTER, INST SCI & TECHNOL, MANCHESTER, LANCASHIRE, ENGLAND

来源：

THIN SOLID FILMS | 1972年 / 14卷 / 01期

关键词：

D O I：

10.1016/0040-6090(72)90373-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：105 / 118

页数：14

共 20 条

[1] LOW-TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS [J].

ALT, LL ;

ING, SW ;

LAENDLE, KW .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (05) :465-465

[2]

BELLAMY LJ, 1965, INFRARED SPECTRA COM

[3]

COATES AD, 1962, AD419618

[4]

COATES AD, 1967, PLASMA CHEMISTRY ELE

[5] MAGNETICALLY SHAPED RF DISCHARGE FOR POLYMER FILM FORMATION [J].

CONNELL, RA ;

GREGOR, LV .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (12) :1198-&

[6]

COTTRELL TL, 1958, STRENGTH CHEMICAL BO

[7] THE IONIZATION AND DISSOCIATION OF OXYGEN BY ELECTRON IMPACT [J].

FROST, DC ;

MCDOWELL, CA .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1958, 80 (23) :6183-6187

[8]

HETHERINGTON G, 1962, J PHYS CHEM GLASSES, V3, P129

[9] GLOW DISCHARGE FORMATION OF SILICON OXIDE AND DEPOSITION OF SILICON OXIDE THIN FILM CAPACITORS BY GLOW DISCHARGE TECHNIQUES [J].

ING, SW ;

DAVERN, W .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (03) :284-&

[10] REACTIONS OF OXYGEN ACTIVATED BY ELECTRICAL DISCHARGE WITH BUTENE-1 [J].

JARVIE, JMS ;

CVETANOVIC, RJ .

CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1959, 37 (03) :529-540

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