ENDOR INVESTIGATION OF THE MICROSCOPIC STRUCTURE OF THE BORON ACCEPTOR IN 6H-SIC

被引:26
作者
MULLER, R
FEEGE, M
GREULICHWEBER, S
SPAETH, JM
机构
关键词
D O I
10.1088/0268-1242/8/7/030
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The boron acceptor in 6H-SiC was investigated using electron paramagnetic resonance (EPR) and electron nuclear double resonance (ENDOR). The hyperfine interactions with B-11 could be determined precisely for the two quasi-cubic and the hexagonal sites. The microscopic model suggested from the EPR and ENDOR results is as follows: boron occupies a silicon site and is a negatively charged ligand to an adjacent carbon atom on which most of the unpaired spin density is located. At low temperatures the symmetry of the two quasi-cubic site defects is monoclinic, while the hexagonal site defect has C3v symmetry about the hexagonal axis. At about 50 K the two quasi-cubic site defects experience a thermally activated motion of the hole at the adjacent carbon about the hexagonal crystal axis and the apparent defect symmetry also becomes C3v. The boron acceptor should be regarded as a boron-induced carbon acceptor.
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页码:1377 / 1384
页数:8
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