QUANTITATIVE X-RAY EMISSION ANALYSIS OF THIN OXIDE FILMS ON TANTALUM

[1] ANDERSEN CA, 1966, ELECTRON MICROPROBE, P58

[2] ANALYSIS OF MATERIALS BY ELECTRON-EXCITED AUGER ELECTRONS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (03) : 1419 - &

[3] OXYGEN SURFACE-DENSITY MEASUREMENTS BASED ON CHARACTERISTIC X-RAY PRODUCTION BY 100-KEV PROTONS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) : 5538 - &

[4] HUTCHINS GA, 1966, ELECTRON MICROPROBE, P390

[5] DETERMINATION OF DENSITY AND DIELECTRIC CONSTANT OF THIN TA2O5 FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (09) : 896 - &

[6] SAYLOR WP, 1969, ADV XRAY ANALYSIS, V12, P457

[7] REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION AND X-RAY EMISSION ANALYSIS OF SURFACES AND THEIR REACTION PRODUCTS [J]. APPLIED PHYSICS LETTERS, 1967, 11 (09) : 298 - &

[8] SEWELL PB, 1969, DEVELOPMENTS APPLIED, VA 7, P61

[1] ANDERSEN CA, 1966, ELECTRON MICROPROBE, P58

[2] ANALYSIS OF MATERIALS BY ELECTRON-EXCITED AUGER ELECTRONS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (03) : 1419 - &

[3] OXYGEN SURFACE-DENSITY MEASUREMENTS BASED ON CHARACTERISTIC X-RAY PRODUCTION BY 100-KEV PROTONS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) : 5538 - &

[4] HUTCHINS GA, 1966, ELECTRON MICROPROBE, P390

[5] DETERMINATION OF DENSITY AND DIELECTRIC CONSTANT OF THIN TA2O5 FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (09) : 896 - &

[6] SAYLOR WP, 1969, ADV XRAY ANALYSIS, V12, P457

[7] REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION AND X-RAY EMISSION ANALYSIS OF SURFACES AND THEIR REACTION PRODUCTS [J]. APPLIED PHYSICS LETTERS, 1967, 11 (09) : 298 - &

[8] SEWELL PB, 1969, DEVELOPMENTS APPLIED, VA 7, P61