N-CHANNEL MOSFETS WITH WSI2 GATE

被引:5
作者
MOHAMMADI, F [1 ]
SARASWAT, KC [1 ]
机构
[1] STANFORD UNIV,INTEGRATED CIRCUITS LAB,STANFORD,CA 94305
来源
ELECTRON DEVICE LETTERS | 1981年 / 2卷 / 02期
关键词
D O I
10.1109/EDL.1981.25326
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:24 / 25
页数:2
相关论文
共 9 条
[1]  
ANTONIADIS DA, 1977, TR50191 STANF U STAN
[2]  
APPELS JA, 1971, PHILIPS RES REP, V26, P157
[3]  
CHOW TP, 1979, DEC TECHN DIG INT EL, P458
[4]   1 MU-M MOSFET VLSI TECHNOLOGY .7. METAL SILICIDE INTERCONNECTION TECHNOLOGY - FUTURE PERSPECTIVE [J].
CROWDER, BL ;
ZIRINSKY, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :369-371
[5]  
GEIPEL HJ, 1980, IEEE T ELECTRON DEVI, V27, P1617
[6]   PROPERTIES OF SPUTTERED TUNGSTEN SILICIDE FOR MOS INTEGRATED-CIRCUIT APPLICATIONS [J].
MOHAMMADI, F ;
SARASWAT, KC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (02) :450-454
[7]  
MOHAMMADI F, 1980, THESIS STANFORD U
[8]  
Saraswat K. C., 1980, IEEE Electron Device Letters, VEDL-1, P18, DOI 10.1109/EDL.1980.25213
[9]  
SARAWAT KC, 1979, DEC TECHN DIG INT EL, P462