CHEMICAL ETCHING OF SILICON .2. THE SYSTEM HF, HNO3, H2O, AND HC2H3O2

[1] Abel E, 1928, Z PHYS CHEM-STOCH VE, V132, P55

[2] Abel E, 1928, Z PHYS CHEM-STOCH VE, V136, P135

[3] Abel E., 1928, Z PHYS CHEM STOCHIOM, V132, P279

[4] Reactivity and constitution of nitric and sulphuric acids. I. Some general considerations. [J]. HELVETICA CHIMICA ACTA, 1935, 18 : 363 - 367

[5] Reactivity and constitution of nitric and sulphuric acids. II. Reactivity of nitric acid in aqueous medium and in acetic medium [J]. HELVETICA CHIMICA ACTA, 1935, 18 : 368 - 375

[6] THE REACTION OF GERMANIUM WITH NITRIC ACID SOLUTIONS .1. THE DISSOLUTION REACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (09) : 487 - 496

[7] CHEMICAL ETCHING OF SILICON .1. THE SYSTEM HF,HNO3, AND H2O [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (06) : 505 - 508

[8] SCHMID G, 1955, Z METALLKUNDE, V45, P128

[9] Vetter K., 1950, Z PHYS CHEM, VB194, P199

[1] Abel E, 1928, Z PHYS CHEM-STOCH VE, V132, P55

[2] Abel E, 1928, Z PHYS CHEM-STOCH VE, V136, P135

[3] Abel E., 1928, Z PHYS CHEM STOCHIOM, V132, P279

[4] Reactivity and constitution of nitric and sulphuric acids. I. Some general considerations. [J]. HELVETICA CHIMICA ACTA, 1935, 18 : 363 - 367

[5] Reactivity and constitution of nitric and sulphuric acids. II. Reactivity of nitric acid in aqueous medium and in acetic medium [J]. HELVETICA CHIMICA ACTA, 1935, 18 : 368 - 375

[6] THE REACTION OF GERMANIUM WITH NITRIC ACID SOLUTIONS .1. THE DISSOLUTION REACTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (09) : 487 - 496

[7] CHEMICAL ETCHING OF SILICON .1. THE SYSTEM HF,HNO3, AND H2O [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (06) : 505 - 508

[8] SCHMID G, 1955, Z METALLKUNDE, V45, P128

[9] Vetter K., 1950, Z PHYS CHEM, VB194, P199