NEW PHOTOCHEMICALLY LABILE PROTECTING GROUP FOR PHOSPHATES

被引:25
作者
FURUTA, T [1 ]
TORIGAI, H [1 ]
OSAWA, T [1 ]
IWAMURA, M [1 ]
机构
[1] TOHO UNIV, FAC SCI, DEPT BIOMOLEC SCI, 2-2-1 MIYAMA, FUNABASHI, CHIBA 274, JAPAN
关键词
D O I
10.1246/cl.1993.1179
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
New photochemically labile phosphate protecting group was developed. These phosphate esters have high molar extinction coefficient (epsilon340 = 34500 dm3 mol-1 cm-1) and rapidly release parent phosphates upon irradiation (>300 nm) with high quantum efficiency for disappearance (phi(dis) = 0.22 at 340 nm).
引用
收藏
页码:1179 / 1182
页数:4
相关论文
共 8 条