HIGHLY DAMAGE-RESISTANT MO MIRROR FOR HIGH-POWER TEA CO2-LASER SYSTEMS

被引:4
作者
ICHIKAWA, Y
YOSHIDA, K
TSUNAWAKI, Y
YAMANAKA, M
YAMANAKA, T
YAMANAKA, C
OKAMOTO, H
MATSUSUE, N
KITAJIMA, K
机构
[1] NIPPON MIN CO LTD, CENT RES LAB, SAITAMA 335, JAPAN
[2] OSAKA UNIV, INST LASER ENGN, SUITA, OSAKA 565, JAPAN
来源
APPLIED OPTICS | 1987年 / 26卷 / 17期
关键词
D O I
10.1364/AO.26.003671
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:3671 / 3675
页数:5
相关论文
共 11 条
[1]  
CALLENDER AB, 1975, NBS US SPEC PUBL, V435, P202
[2]  
GULATI SK, 1976, NBS US SPEC PUBL, V435, P357
[3]  
Ichikawa Y., 1985, Technology Reports of the Osaka University, V35, P245
[4]   CHARACTERISTICS OF A PLASMA DETECTOR FOR TEA CO-2 LASER-PULSE MEASUREMENTS [J].
ICHIKAWA, Y ;
TSUNAWAKI, Y ;
YAMANAKA, M ;
YAMANAKA, T ;
MITSUISHI, A ;
YAMANAKA, C .
INFRARED PHYSICS, 1985, 25 (04) :633-640
[5]  
OKAMOTO H, 1985, 17TH P ANN S OPT MAT, P36
[6]  
Palik E. D., 1985, HDB OPTICAL CONSTANT
[7]   INFRARED OPTICAL ABSORPTIVITY AND REFLECTIVITY OF HOT-PRESSED SIC [J].
SHAAPUR, F ;
ALLEN, SD .
APPLIED OPTICS, 1987, 26 (02) :196-197
[8]  
TSUNAWAKI Y, 1984, 9TH INT C INFR MILL
[9]  
WEAST RC, 1985, HDB CHEM PHYSICS
[10]  
WONG SW, 1978, NBS US SPEC PUBL, V435, P132