GALVANOMAGNETIC MEASUREMENTS ON THIN PBSE EPITAXIAL-FILMS AS A FUNCTION OF O2 AND H EXPOSURE

被引：7

作者：

MCLANE, GF ^{[1
]}

机构：

[1] UNIV PENN,MOORE SCH,PHILADELPHIA,PA 19104

来源：

关键词：

D O I：

10.1063/1.1663703

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2926 / 2930

页数：5

共 8 条

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[6]

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ZEMEL JN, PRIVATE COMMUNICATIO