HIGH-QUALITY FLUX CONTROL-SYSTEM FOR ELECTRON-GUN EVAPORATION

被引:1
作者
APPELBOOM, HM
HADLEY, P
VANDERMAREL, D
MOOIJ, JE
机构
[1] Faculty of Applied Physics, Delft University of Technology, 2600 GA, Delft
关键词
D O I
10.1109/20.133460
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A high quality flux control system for electron gun evaporation has been developed and tested for the MBE growth of high temperature superconductors. The system can be applied to any electron gun without altering the electron gun itself. Essential elements of the system are a high bandwidth mass spectrometer, control electronics and a high voltage modulator to sweep the electron beam over the melt at high frequencies. The sweep amplitude of the electron beam is used to control the evaporation flux at high frequencies. The feedback loop of the system has a bandwidth of over 100 Hz, which makes it possible to grow superlattices and layered structures in a fast and precisely controlled manner. The drift of the total system is dominated by the temperature drift of the secondary emission multiplier in the mass spectrometer. This drift is typically 1-2% per hour for copper as measured by an independent quartz crystal thickness monitor. The feedback system has successfully been used for the fabrication of YBa2Cu3O7 thin films.
引用
收藏
页码:1467 / 1470
页数:4
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