ROLE OF OXIDE DEFECT SITES IN BREAKDOWN OF NIO FILMS

被引：14

作者：

MACDOUGALL, B

机构：

来源：

关键词：

D O I：

10.1149/1.2131318

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1883 / 1885

页数：3

共 8 条

[1]

AMBROSE JR, 1969, 4TH P INT C MET CORR, P698

[2] MECHANISM OF ANODIC-OXIDATION OF NICKEL [J].

MACDOUGALL, B ;

COHEN, M .

[3] OPEN-CIRCUIT BREAKDOWN OF ANODICALLY FORMED NICKEL-OXIDE [J].

MACDOUGALL, B ;

COHEN, M .

[4] ANODIC OXIDE-FILMS ON NICKEL IN ACID SOLUTIONS [J].

MACDOUGALL, B ;

COHEN, M .

[5] BREAKDOWN OF OXIDE-FILMS ON NICKEL [J].

MACDOUGALL, B ;

COHEN, M .

[6]

MACDOUGALL B, 1977, 4TH INT S PASS

[7]

MCBEE CL, 1971, INT C LOCALIZED CORR, P252

PICKERING, HW ;

FRANKENT.RP .