WAFER TREATMENT USING ELECTROLYSIS-IONIZED WATER

被引：4

作者：

AOKI, H

NAKAMORI, M

AOTO, N

IKAWA, E

机构：

[1] ULSI Device Development Laboratories, NEC Corporation, Sagamihara, Kanagawa, 229

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 10期

关键词：

ELECTROLYSIS-IONIZED WATER; WET TREATMENT; ECOLOGICALLY SAFE; PH; OXIDATION-REDUCTION POTENTIAL; CLEANING; ETCHING; LOW COST;

D O I：

10.1143/JJAP.33.5686

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electrolysis-ionized water treatment is shown to be useful for removing polystyrene particles from contact holes, silicon surface cleaning and the removal of metal contamination such as copper. Electrolysis-ionized water has a controllable pH and a higher oxidation-reduction potential than chemicals. Moreover, this water does not contain acid or alkaline chemicals, and can easily be neutralized without adding chemicals. Electrolysis-ionized water treatment has great potential for ecologically safe and low cost semiconductor processing.

引用

页码：5686 / 5689

页数：4