ANTIREFLECTION SURFACES IN SILICON USING BINARY OPTICS TECHNOLOGY

被引:161
作者
MOTAMEDI, ME
SOUTHWELL, WH
GUNNING, WJ
机构
[1] Rockwell International Science Center, Thousand Oaks, CA, 91360
来源
APPLIED OPTICS | 1992年 / 31卷 / 22期
关键词
ANTIREFLECTION; BINARY OPTICS; MOTH-EYE SURFACE; INFRARED-REFLECTIVITY REDUCTION;
D O I
10.1364/AO.31.004371
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Binary optics processing methods were applied to a silicon substrate to generate an array of small pillars in order to enhance transmission. The volume fraction of the silicon in the pillars was chosen to simulate a single homogeneous antireflection layer, and the pillar height was targeted to be a quarter-wave thickness. A mask was generated, using a graphics computer-aided design system; reactive-ion etching was used to generate the pillars. An improvement in long-wavelength infrared transmission is observed, with diffraction and scattering dominating at shorter wavelengths.
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页码:4371 / 4376
页数:6
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