INVERSE PHOTOEMISSION-STUDY OF THE SI(100)-(2X1) K-SURFACE

被引：45

作者：

BATRA, IP ^{[1
]}

NICHOLLS, JM ^{[1
]}

REIHL, B ^{[1
]}

机构：

[1] IBM CORP,ZURICH RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574338

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：898 / 901

页数：4

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