TEMPERATURE-PROGRAMMED DESORPTION MASS-SPECTROMETRY OF BUTYLOXYSILYL GROUPS ON SILICA SURFACES

被引：10

作者：

GUNKO, VM

POKROVSKY, VA

机构：

[1] Institute of Surface Chemistry, Kiev

来源：

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES | 1995年 / 148卷 / 1-2期

关键词：

BUTYLOXYSILYL GROUP; DYNAMIC SIMULATION; SILICA SURFACE; TPD;

D O I：

10.1016/0168-1176(95)04174-J

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

The decomposition reactions of the alkoxide groups =SiO(CH2)(3)CH3 on dispersed silica (Butosil) surfaces have been studied by temperature-programmed desorption mass spectrometry (TPD) and quantum chemical (AM1) methods. The rate constants were calculated on the basis of experimental data and by the RRKM theory. The potential energy surface profiles were found by adiabatic and dynamic reaction coordinate methods. The main desorption channel corresponds to the elimination of 1-butene above 600 K. The TPD data suggest that this reaction is of first order and that it can be viewed as ''unimolecular''.

引用

页码：45 / 54

页数：10

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