ELECTRON-EMISSION FROM CLEAN METAL-SURFACES INDUCED BY LOW-ENERGY LIGHT-IONS

被引:255
作者
BARAGIOLA, RA
ALONSO, EV
FLORIO, AO
机构
[1] Centro Atómico Bariloche, Instituto Balseiro, Universidad Nacional de Cuyo
关键词
D O I
10.1103/PhysRevB.19.121
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have measured the electron emission yields of clean Li, Al, Cr, Cu, Ag, and Au surfaces under bombardment with H+, H2+, D+, D2+, and He+ ions in the energy range 2-50 keV. The clean surfaces were produced by in-situ evaporation of high-purity metals under ultrahigh-vacuum conditions. It is found that the Z2 dependence of the yields for hydrogen and helium projectiles are very similar, that the yields for H+ and D+ show the same energy dependence as that of the electronic stopping powers, that molecular ions give lower yields per atom than atomic ions, and that isotope effects are negligible in our energy range. It is proposed that kinetic-electron emission under low-energy-light-ion bombardment results mainly from the escape of excited electrons produced by direct binary collisions between the projectile and the valence electrons of the target. © 1979 The American Physical Society.
引用
收藏
页码:121 / 129
页数:9
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