共 25 条
- [1] ALLAN KD, 1986, J ELECTROCHEM SOC, V133, P2331
- [2] AUCIELLO O, 1984, ION BEAM MODIFICATIO
- [4] BEHRISCH R, 1983, TOPICS APPLIED PHYSI, V52
- [5] CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P244
- [6] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403
- [7] COTLER TJ, IN PRESS
- [8] COMPUTER-SIMULATION OF A CF4 PLASMA-ETCHING SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (05) : 1522 - 1531
- [9] FLAMM DL, 1979, SOLID STATE TECHNOL, V22, P109
- [10] THE REACTION OF FLUORINE-ATOMS WITH SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3633 - 3639