FORMATION OF NANOMETER-SCALE GROOVES IN SILICON WITH A SCANNING TUNNELING MICROSCOPE

被引:156
作者
KOBAYASHI, A
GREY, F
WILLIAMS, RS
AONO, M
机构
[1] ERATO, JRDO, AONO ATOMCRAFT PROJECT, 5-9-9 TOHKOHDAI, TSUKUBA, IBARAKI 30026, JAPAN
[2] UNIV CALIF LOS ANGELES, DEPT CHEM & BIOCHEM, LOS ANGELES, CA 90024 USA
关键词
D O I
10.1126/science.259.5102.1724
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Grooves a few nanometers wide can be formed on a Si(111) surface with a scanning tunneling microscope when the tip is above a critical voltage. This may provide a promising approach to nanodevice fabrication. The dependence of the critical voltage on tunneling current, tip polarity, and tip material was studied with silver, gold, platinum, and tungsten tips. The results are consistent with field emission of positive and negative silicon ions. The variation of critical voltage with current is explained quantitatively by a simple tunneling equation that includes the effect of the contact potential between tip and sample.
引用
收藏
页码:1724 / 1726
页数:3
相关论文
共 23 条