INFLUENCE OF DEPOSITION POTENTIAL ON THE VOLTAMMETRIC BEHAVIOR OF POTENTIOSTATICALLY FORMED PLATINIZED ELECTRODES

被引：20

作者：

BAKOS, I

HORANYI, G

机构：

[1] Central Research Institute for Chemistry, Hungarian Academy of Sciences, H-1525 Budapest

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1995年 / 397卷 / 1-2期

基金：

匈牙利科学研究基金会;

关键词：

PLATINIZATION; DEPOSITION POTENTIAL; VOLTAMMETRIC BEHAVIOR; PLATINIZED ELECTRODES;

D O I：

10.1016/0022-0728(95)04123-4

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The voltammetric behaviour of platinized electrodes in relation to their formation potential was studied (deposition from H2PtCl6 solution). It was found that the ratio of the heights of the two most characteristic hydrogen peaks appearing on the voltammograms obtained in 0.5 mol dm(-3) H2SO4 depends on the potential of the formation of the electrode exhibiting one or two singularities, depending on the composition of the platinizing solution. It is shown that within a certain range of parameters a preselected pattern in the voltammetric behaviour of platinized electrodes with high real surface area (roughness factor values up to 600-800) can be realized by choosing an appropriate condition for the platinization.

引用

页码：105 / 110

页数：6

共 23 条

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