SPUTTER DEPOSITION OF BISRCACUO THIN-FILMS

被引:17
作者
FUKUTOMI, M
MACHIDA, J
TANAKA, Y
ASANO, T
MAEDA, H
HOSHINO, K
机构
[1] NATL RES INST MET,TSUKUBA LABS,TSUKUBA,IBARAKI 305,JAPAN
[2] MITSUI MIN & SMELTING CO LTD,CENT RES LAB,AGEO,SAITAMA 362,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1988年 / 27卷 / 04期
关键词
D O I
10.1143/JJAP.27.L632
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L632 / L633
页数:2
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