INTERACTIONS IN COPTCR/SIO2 COMPOSITE THIN-FILMS

被引：14

作者：

ELHILO, M ^{[1
]}

OGRADY, K ^{[1
]}

NGUYEN, TA ^{[1
]}

BAUMGART, P ^{[1
]}

SANDERS, IL ^{[1
]}

机构：

[1] IBM ADSTAR CORP,SAN JOSE,CA 95193

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1993年 / 29卷 / 06期

关键词：

D O I：

10.1109/20.281282

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper the behaviour of CoPtCr/SiO2 composite thin Alms with variable percentages of SiO2 (0%--> 35%) is reported. From measurements of remanence curves and interaction characterisation via the delta plot curves, films with 20%--> 24% SiO2 show a wider range of switching fields and lower magnitude of interaction in comparison with the films containing a lower concentration of SiO2

引用

页码：3724 / 3726

页数：3

共 7 条

[1] THE EFFECTS OF DIFFERENT DEMAGNETIZATION PROCESSES ON INTERACTION EFFECTS IN THIN-FILM MEDIA [J].

ELHILO, M ;

OGRADY, K ;

MAYO, PI ;

CHANTRELL, RW ;

SANDERS, IL ;

HOWARD, JK .

IEEE TRANSACTIONS ON MAGNETICS, 1992, 28 (05) :3282-3284

[2]

ELHILO M, IN PRESS J MAGN MAGN

[3]

ELHILO M, 1993, J MAGN MAGN MATER, V120, P224

[4]

IRENE A, 1991, IEEE T MAGN, V27, P5037

[5]

Kelly P. E., 1989, IEEE Transactions on Magnetics, V25, P3881, DOI 10.1109/20.42466

[6]

MAYO PI, 1990, J MAG MAG MATER, V95, P109

[7] COPTCR COMPOSITE MAGNETIC THIN-FILMS [J].

SHIMIZU, T ;

IKEDA, Y ;

TAKAYAMA, S .

IEEE TRANSACTIONS ON MAGNETICS, 1992, 28 (05) :3102-3104

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