ELECTRODEPOSITION OF THIN MAGNETIC PERMALLOY FILMS

被引：39

作者：

VENKATASETTY, HV

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1970年 / 117卷 / 03期

关键词：

D O I：

10.1149/1.2407524

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：403 / +

页数：1

共 23 条

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[5]

BRENNER A, 1963, ELECTRODEPOSITION AL, V2, P303

[6] QUASISTATIC FLUX REVERSAL CHARACTERISTICS OF ELECTRODEPOSITED THIN PERMALLOY FILMS [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (01) :39-42

[7] ELECTORDEPOSITED NICKEL-IRON-MOLYBDENUM THIN MAGNETIC FILMS [J].

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[8] THE ELETRODEPOSITION OF NICKEL-IRON-PHOSPHORUS THIN FILMS FOR COMPUTER MEMORY USE [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (01) :35-39

[9] ELECTRODEPOSITED NI-FE-AS MAGNETIC THIN FILMS [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (05) :441-&

[10] DOMAIN PATTERNS IN ELECTRODEPOSITED NICKEL-IRON THIN FILMS [J].

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TSUYA, N .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (04) :795-&

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