DFB RIDGE WAVE-GUIDE LASERS AT LAMBDA= 1.5 MU-M WITH 1ST-ORDER GRATINGS FABRICATED USING ELECTRON-BEAM LITHOGRAPHY

被引：8

作者：

ARMISTEAD, CJ ^{[1
]}

BUTLER, BR ^{[1
]}

CLEMENTS, SJ ^{[1
]}

COLLAR, AJ ^{[1
]}

MOULE, DJ ^{[1
]}

WHEELER, SA ^{[1
]}

FICE, MJ ^{[1
]}

AHMED, H ^{[1
]}

机构：

[1] CAVENDISH LAB,MICROELECTR RES GRP,CAMBRIDGE SCI PK,MILTON RD,CAMBRIDGE CB4 4FW,ENGLAND

来源：

ELECTRONICS LETTERS | 1987年 / 23卷 / 11期

关键词：

ELECTRON BEAMS - LITHOGRAPHY - OPTICAL GRATINGS;

D O I：

10.1049/el:19870425

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

DFB ridge waveguide lasers at lambda equals 1. 5 mu m have been fabricated with uniform first-order gratings using electron beam lithography. After MOCVD overgrowth of the grating and fabrication of the ridge waveguides the devices have shown thresholds as low as 22 ma and operation in a single longitudinal mode to powers greater than 10 mw. These results demonstrate that electron beam lithography can be used for the fabrication of DBF lasers with the fine pitch required for first-order gratings.

引用

页码：592 / 593

页数：2

共 4 条

[1] LOW-THRESHOLD RIDGE WAVE-GUIDE LASERS AT LAMBDA =1.5-MU-M [J].

ARMISTEAD, CJ ;

WHEELER, SA ;

PLUMB, RG ;

MUSK, RW .

ELECTRONICS LETTERS, 1986, 22 (21) :1145-1147

[2] FABRICATION OF 1ST-ORDER GRATINGS FOR 1.5 MU-M DFB LASERS BY HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY [J].

FICE, MJ ;

AHMED, H ;

CLEMENTS, S .

ELECTRONICS LETTERS, 1987, 23 (11) :590-592

[3] ON THE USE OF EFFECTIVE REFRACTIVE-INDEX IN DFB LASER MODE SEPARATION [J].

IGA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (10) :1630-1630

[4] GAMMA-4-SHIFTED INGAASP/INP DFB LASERS [J].

UTAKA, K ;

AKIBA, S ;

SAKAI, K ;

MATSUSHIMA, Y .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1986, 22 (07) :1042-1051

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