STRUCTURAL CHARACTERIZATION OF COCU MULTILAYERS GROWN BY LASER ABLATION DEPOSITION

被引:13
作者
KOOLS, JCS
COEHOORN, R
HAKKENS, FJG
FASTENAU, RHJ
机构
[1] Philips Research Labs, 5600 JA Eindhoven, P.O. Box 80
关键词
D O I
10.1016/0304-8853(93)91155-Z
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Multilayers of 25 x (1.0 nm Cu/1.6 nm Co) have been grown on Si(100) substrates by the method of laser ablation deposition. A structural characterization of the superlattices has been performed using XRD and TEM. It is found that multilayers with strong preferential orientation ((100) on Cu buffer layers and (111) on Fe buffer layers) can be grown.
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页码:83 / 87
页数:5
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