OPTICAL WAVE-GUIDES;
CHEMICAL VAPOR DEPOSITION;
INTEGRATED OPTICS;
PHOTOREFRACTIVE EFFECT;
D O I:
10.1049/el:19940935
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Germanosilicate film waveguides fabricated by plasma enhanced chemical vapour deposition have been shown to possess high sensitivity towards W induced index changes. As an illustration of possible future applications, direct point-to-point writing of buried singlemode channel waveguides using a focused, Continuous wave, UV laser beam is demonstrated.