DNA TECHNOLOGY IN CHIP CONSTRUCTION

被引：19

作者：

DIMAURO, E ^{[1
]}

HOLLENBERG, CP ^{[1
]}

机构：

[1] UNIV DUSSELDORF,INST MIKROBIOL,W-4000 DUSSELDORF 1,GERMANY

来源：

ADVANCED MATERIALS | 1993年 / 5卷 / 05期

关键词：

D O I：

10.1002/adma.19930050512

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The use of photolithography to produce 3 nm features sounds like a pipe dream. But is it? The circuit size achievable with X-ray lithography cannot be pushed below 0.25 mum due to limiting lens technology. Now it has been shown that the genetic material DNA can be used to form micro-photomasks with features 100 times smaller than those on current silicon chips. The construction of nucleic acid networks, their conversion into electron-conducting networks, and their use in photolithography are described.

引用

页码：384 / 386

页数：3