UNDERSTANDING HIGH NUMERICAL APERTURE OPTICAL LITHOGRAPHY

被引：10

作者：

FLAGELLO, DG

ROSENBLUTH, AE

PROGLER, C

ARMITAGE, J

机构：

[1] IBM T.J. Watson Research Center, Yorktown Heights, NY

[2] IBM East Fishkill, East Fishkill, NY

来源：

MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期

关键词：

Imaging Techniques - Mathematical Models - Photoresists;

D O I：

10.1016/0167-9317(92)90021-I

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper explores fundamental imaging phenomena that become appreciable as the numerical aperture (NA) of imaging lenses increase beyond 0.5. A high NA imaging model is formulated based on plane wave decomposition of the imaging lens exit pupil. The model shows that for NAs above about 0.55, linear polarized illumination gives rise to "astigmatic" effects in the image. Photoresist exposures in polarized light on a 0.55 NA stepper show approximately 1% x-y linewidth differences in experimental tests.

引用

页码：105 / 108

页数：4