ELECTRICAL RESISTOMETRIC DETECTION OF RELAXATION IN AN AMORPHOUS PD-SI-SB ALLOY

被引:27
作者
MARCUS, MA [1 ]
机构
[1] HARVARD UNIV,CAMBRIDGE,MA 02138
来源
ACTA METALLURGICA | 1979年 / 27卷 / 05期
关键词
D O I
10.1016/0001-6160(79)90123-8
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
The effects of configurational relaxation on the electrical resistivity of a metallic glass, PdSiSb over the temperature range 30-400°C were studied. At low temperatures, the resistivity was representable as a quadratic form in the temperature. Define Δ ̃gr as the deviation of ρ from this formula (due to relaxation). As the temperature rises, Δ ̃gr drops, reaching a minimum, -0.80% of ρ(RT), then rises again, finally dropping due to crystallization. A fictive-température model, with relaxation rates given by free-volume theory, quantitatively explains the data. © 1979.
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页码:879 / 891
页数:13
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