IN-SITU X-RAY-DIFFRACTION ANALYSIS OF THE C49-C54 TITANIUM SILICIDE PHASE-TRANSFORMATION IN NARROW LINES

被引：60

作者：

ROY, RA ^{[1
]}

CLEVENGER, LA ^{[1
]}

CABRAL, C ^{[1
]}

SAENGER, KL ^{[1
]}

BRAUER, S ^{[1
]}

JORDANSWEET, J ^{[1
]}

BUCCHIGNANO, J ^{[1
]}

STEPHENSON, GB ^{[1
]}

MORALES, G ^{[1
]}

LUDWIG, KF ^{[1
]}

机构：

[1] BOSTON UNIV,DEPT PHYS,BOSTON,MA 02215

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 14期

关键词：

D O I：

10.1063/1.113349

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The transformation of titanium silicide from the C49 to the C54 structure was studied using x-ray diffraction of samples containing arrays of narrow lines of preformed C49 TiSi2. Using a synchrotron x-ray source, diffraction patterns were collected at 1.5-2°C intervals during sample heating at rates of 3 or 20°C/s to temperatures of 1000-1100°C. The results show a monotonic increase in the C54 transition temperature by as much as 180°C with a decreasing linewidth from 1.0 to 0.1 μm. Also observed is a monotonic increase in (040) preferred orientation of the C54 phase with decreasing linewidth. The results demonstrate the power of in situ x-ray diffraction of narrow line arrays as a tool to study finite size effects in thin-film reactions.© 1995 American Institute of Physics.

引用

页码：1732 / 1734

页数：3

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