ADSORPTION DYNAMICS FOR THE SYSTEM HYDROGEN/PALLADIUM AND ITS RELATION TO THE SURFACE ELECTRONIC-STRUCTURE

We have determined differential sticking coefficients for a monoenergetic nozzle beam of hydrogen on Pd(111) and Pd(110). In particular the energy dependence and the angular variation of the initial sticking coefficient were measured. The results indicate that adsorption of hydrogen on palladium occurs in parallel processes through a direct path with an activation barrier of perhaps 50 meV or less and a precursor path. There is relatively little difference in the adsorption properties of the (111) and the (110) plane. The appearance of a molecular precursor on the (111) plane can be related to the electronic structure of palladium, in particular to the absence of occupied Shockley surface states, as compared to Ni(111) and Pt(111). Pre-adsorbed potassium on a (110) plane acts as an inhibitor to adsorption. Different inhibiting mechanisms are observed for the direct adsorption path and the precursor path. At high potassium coverage the precursor path is completely suppressed.