ELECTRON SHIELDING IN HEAVILY DOPED SEMICONDUCTORS

被引:56
作者
KRIEGER, JB
机构
[1] Physics Department, Polytechnic Institute of Brooklyn, Brooklyn, NY
来源
PHYSICAL REVIEW | 1969年 / 178卷 / 03期
关键词
D O I
10.1103/PhysRev.178.1337
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The ionization energy of an electron bound to a donor atom is calculated as a function of the number of electrons in the conduction band and the temperature assuming Thomas-Fermi screening. The results are compared with a previous numerical calculation performed for InSb. We also show that it is possible to induce a Mott transition by applying stress to a degenerately doped many-valley semiconductor, with a resulting change from a metallic to an insulating phase. © 1969 The American Physical Society.
引用
收藏
页码:1337 / &
相关论文
共 9 条
[1]  
FRIEDEL J, 1952, PHILOS MAG, V43, P153
[2]  
HILSUM C, 1961, SEMICONDUCTING 3 5 C, P73
[3]  
KOHN W, 1955, PHYS REV, V97, P869
[4]   SINGLY-IONIZED-IMPURITY SCATTERING IN DEGENERATE MATERIAL [J].
KRIEGER, JB ;
STRAUSS, S .
PHYSICAL REVIEW, 1968, 169 (03) :674-&
[5]   ELECTRON SHIELDING IN N-INSB [J].
LI, SP ;
LOVE, WF ;
MILLER, SC .
PHYSICAL REVIEW, 1967, 162 (03) :728-&
[6]   IMPURITY SCATTERING IN SEMICONDUCTORS [J].
MANSFIELD, R .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1956, 69 (01) :76-82
[7]   THE TRANSITION TO THE METALLIC STATE [J].
MOTT, NF .
PHILOSOPHICAL MAGAZINE, 1961, 6 (62) :287-309
[8]   ELECTRICAL PROPERTIES OF PURE SILICON AND SILICON ALLOYS CONTAINING BORON AND PHOSPHORUS [J].
PEARSON, GL ;
BARDEEN, J .
PHYSICAL REVIEW, 1949, 75 (05) :865-883
[9]   THEORY OF TRANSPORT EFFECTS IN SEMICONDUCTORS - THERMOELECTRICITY [J].
PRICE, PJ .
PHYSICAL REVIEW, 1956, 104 (05) :1223-1239