A KINETIC-STUDY OF THE PLASMA-ETCHING PROCESS .2. PROBE MEASUREMENTS OF ELECTRON PROPERTIES IN AN RF PLASMA-ETCHING REACTOR

被引：94

作者：

KUSHNER, MJ ^{[1
]}

机构：

[1] SANDIA NATL LABS,DIV 4216,ALBUQUERQUE,NM 87185

来源：

关键词：

D O I：

10.1063/1.331075

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2939 / 2946

页数：8

共 31 条

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COBURN, JW ;

KAY, E .