VALENCE-BAND AND CORE PHOTOELECTRON SPECTROSCOPIC STUDIES OF MOLYBDENUM AQUEOUS OXIDATION AND THE INFLUENCE OF ARGON-ION ETCHING

被引:11
作者
HIXSON, H [1 ]
SHERWOOD, PMA [1 ]
机构
[1] KANSAS STATE UNIV AGR & APPL SCI,DEPT CHEM,MANHATTAN,KS 66506
来源
JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS | 1995年 / 91卷 / 20期
关键词
D O I
10.1039/ft9959103593
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The behaviour of a polished molybdenum metal surface upon exposure to both aerated and deaerated water and 1.0 mol dm(-3) sodium chloride solution, in a previously described anaerobic cell, has been studied by X-ray photoelectron spectroscopy (XPS). No oxidation was found on metal samples exposed to deaerated solutions. Exposure to aerated sodium chloride solution also produced no oxide formation. However, exposing the polished metal surface to aerated water produced significant oxidation, in agreement with previous results. The valence band studies complement the core-level data, as well as providing information not available in the core spectra. We find that metal surfaces cleaned by argon-ion etching rather than by mechanical polishing of the molybdenum are inert to oxidation by aerated water. These etched surfaces show differences in the valence-band region that are consistent with the generation of a defect molybdenum structure, possibly containing oxygen. This defect structure, generated by argon-ion etching, appears to passivate the metal. The valence-band data were interpreted by calculated spectra generated by multiple-scattered-wave X-alpha cluster calculations.
引用
收藏
页码:3593 / 3601
页数:9
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