IDEAL UNRECONSTRUCTED HYDROGEN TERMINATION OF THE SI(111) SURFACE OBTAINED BY HYDROGEN EXPOSURE OF THE SQUARE-ROOT-3 X SQUARE-ROOT-3-IN SURFACE

被引:64
作者
LANDEMARK, E
KARLSSON, CJ
UHRBERG, RIG
机构
[1] Department of Physics and Measurement Technology, Linköping Institute of Technology
来源
PHYSICAL REVIEW B | 1991年 / 44卷 / 04期
关键词
D O I
10.1103/PhysRevB.44.1950
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hydrogen exposure of the Si(111)square-root 3 x square-root 3-In surface resulted in a replacement of the Si-In bonds by Si-H bonds as evidenced by core-level and angle-resolved photoelectron spectroscopy. Saturation of the Si dangling bonds by hydrogen atoms led to the formation of an unreconstructed Si(111)1 x 1-H surface. Besides a peak due to Si-H bonds, a sharp peak, due to Si-Si backbonds, appeared in the valence-band spectra. The experimental dispersions of these states showed excellent agreement with calculated surface bands. The In atoms formed metallic islands on a small part of the surface (approximately 5%).
引用
收藏
页码:1950 / 1953
页数:4
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