THE EFFECT OF TRAPPED ARCON ON THE MINIMUM TEMPERATURE FOR IMPULSE STIMULATED EXPLOSIVE CRYSTALLIZATION OF DC SPUTTER-DEPOSITED AMORPHOUS-GERMANIUM FILMS

被引：6

作者：

WICKERSHAM, CE

机构：

来源：

SOLID STATE COMMUNICATIONS | 1980年 / 34卷 / 12期

关键词：

D O I：

10.1016/0038-1098(80)91096-0

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：907 / 910

页数：4

共 10 条

[1] Studies on explosive antimony. I. The Microscopy of polished surfaces [J].

Coffin, CC ;

Johnston, S .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-CONTAINING PAPERS OF A MATHEMATICAL AND PHYSICAL CHARACTER, 1934, 146 (A858) :0564-0570

[2]

Gore G., 1855, PHILOS MAG, V9, P73

[3] DETERMINATION OF ARGON CONTENT OF SPUTTERED SIO2 FILMS BY X-RAY FLUORESCENCE [J].

HOFFMEISTER, W ;

ZUEGEL, M .

THIN SOLID FILMS, 1969, 3 (01) :35-+

[4] OBSERVATIONS ON EXPLOSIVE CRYSTALLIZATION OF NON-CRYSTALLINE GE [J].

MESSIER, R ;

TAKAMORI, T ;

ROY, R .

SOLID STATE COMMUNICATIONS, 1975, 16 (03) :311-314

[5] VELOCITY OF PROPAGATION IN SHOCK-CRYSTALLIZATION OF SPUTTERED AMORPHOUS GERMANIUM [J].

MINEO, A ;

MATSUDA, A ;

KUROSU, T ;

KIKUCHI, M .

SOLID STATE COMMUNICATIONS, 1973, 13 (03) :329-331

[6] NEW NONCRYSTALLINE GERMANIUM WHICH CRYSTALLIZES EXPLOSIVELY AT ROOM-TEMPERATURE [J].

TAKAMORI, T ;

ROY, R ;

MESSIER, R .

APPLIED PHYSICS LETTERS, 1972, 20 (05) :201-&

[7] PHENOMENOLOGY OF EXPLOSIVE CRYSTALLIZATION OF SPUTTERED NON-CRYSTALLINE GERMANIUM FILMS [J].

TAKAMORI, T ;

MESSIER, R ;

ROY, R .

JOURNAL OF MATERIALS SCIENCE, 1973, 8 (12) :1809-1816

[8] IMPULSE STIMULATED EXPLOSIVE CRYSTALLIZATION OF SPUTTER DEPOSITED AMORPHOUS (IN,GA)SB FILMS [J].

WICKERSHAM, CE ;

BAJOR, G ;

GREENE, JE .

SOLID STATE COMMUNICATIONS, 1978, 27 (01) :17-20

[9]

WICKERSHAM CE, 1978, THESIS U ILLINOIS

[10]

ZALIVA VI, 1972, JETP LETT-USSR, V15, P14

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