CHEMICAL VAPOR-DEPOSITED BORIDES OF THE FORM (TI,ZR)B2 AND (TA,TI)B2

被引：25

作者：

RANDICH, E

机构：

[1] Sandia Laboratories A U.S. Department of Energy facility., Albuquerque

来源：

THIN SOLID FILMS | 1979年 / 63卷 / 02期

关键词：

D O I：

10.1016/0040-6090(79)90034-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZrB2, (Ti,Zr)B2, (Ta,Ti)B2 and Ta2B have been synthesized in the temperature range of 1073-1373 K using chemical vapor deposition procedures. The materials were produced as fully dense coatings on graphite using the hydrogen reduction of BCl3 and the respective metal chloride(s). It was not possible to deposit pure TaB2 but a phase identified as Ta2B was formed when both TiCl4 and TaCl5 were present in the reactant gas mixture. Hardness measurements of the various boride phases gave the following VHN25 values (kg mm-2): ZrB2, 2200; (Ti,Zr)B2, about 3700 (maximum); Ta2B, 2430; (Ta0.75Ti0.25)B2, 3100. © 1979.

引用

页码：309 / 313

页数：5

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