PATTERN-FORMATION AND PHOTOPHYSICAL APPLICATIONS OF LANGMUIR-BLODGETT MULTILAYERS BASED ON POLYGLUTAMATES

被引：24

作者：

MATHAUER, K ^{[1
]}

MATHY, A ^{[1
]}

BUBECK, C ^{[1
]}

WEGNER, G ^{[1
]}

HICKEL, W ^{[1
]}

SCHEUNEMANN, U ^{[1
]}

机构：

[1] HOECHST AG, W-6230 FRANKFURT 80, GERMANY

来源：

THIN SOLID FILMS | 1992年 / 210卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(92)90308-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Langmuir-Blodgett multilayers from ternary copolymers of gamma-methyl-, gamma-octadecyl-, and gamma-(ll-cinnamoylundec-l-yl)-L-glutamate were prepared. Pattern formation by UV irradiation through a mask and by electron beam is demonstrated. Optical loss measurements on waveguiding films (500 layers/thickness 870 nm) yielded an attenuation of 3.6 dB/cm at 633 nm.

引用

页码：449 / 451

页数：3

共 9 条

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