VACANCY TETRAHEDRA IN COPPER DUE TO ELECTRON IRRADIATION IN HIGH-VOLTAGE MICROSCOPE

被引：18

作者：

IPOHORSKI, M

SPRING, MS

机构：

来源：

关键词：

D O I：

10.1080/14786437008226936

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1279 / +

页数：1

共 7 条

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