DIRECT KINETIC-STUDIES OF SILICON HYDRIDE RADICALS IN THE GAS-PHASE

被引:212
作者
JASINSKI, JM
BECERRA, R
WALSH, R
机构
[1] CSIC, INST QUIM FIS ROCASOLANO, E-28006 MADRID, SPAIN
[2] UNIV READING, DEPT CHEM, READING RG6 2AD, BERKS, ENGLAND
关键词
D O I
10.1021/cr00037a004
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
[No abstract available]
引用
收藏
页码:1203 / 1228
页数:26
相关论文
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