THE EFFECT OF CHLORIDE IONS ON COPPER DEPOSITION

[1] ARNDT K, 1929, TECHNISCHE ELECTROCH, P297

[2] Baernstein HD, 1928, J BIOL CHEM, V78, P481

[3] BODLANDER G, 1907, Z ELEKTROCHEM, V7, P159

[4] BODLANDER G, 1902, Z ANORG CHEM, V31, P7

[5] BRENNER A, 1941, P AM ELECTROPLATERS, V29, P28

[6] BRENNER A, 1940, P AM ELECTROPLATERS, V28, P95

[7] EHRENBERG W, 1935, KOLLOID BEIHEFTE, V42, P1

[8] FOERSTER F, 1897, Z ANORG CHEM, V14, P106

[9] FORSTER F, 1904, Z ELEKTROCHEM, V10, P736

[10] GAUVIN W, 1943, CAN J RES B, V21, P125

[1] ARNDT K, 1929, TECHNISCHE ELECTROCH, P297

[2] Baernstein HD, 1928, J BIOL CHEM, V78, P481

[3] BODLANDER G, 1907, Z ELEKTROCHEM, V7, P159

[4] BODLANDER G, 1902, Z ANORG CHEM, V31, P7

[5] BRENNER A, 1941, P AM ELECTROPLATERS, V29, P28

[6] BRENNER A, 1940, P AM ELECTROPLATERS, V28, P95

[7] EHRENBERG W, 1935, KOLLOID BEIHEFTE, V42, P1

[8] FOERSTER F, 1897, Z ANORG CHEM, V14, P106

[9] FORSTER F, 1904, Z ELEKTROCHEM, V10, P736

[10] GAUVIN W, 1943, CAN J RES B, V21, P125