ADSORPTION OF XENON AND HYDROGEN ON EVAPORATED FILMS OF TUNGSTEN AND NICKEL

被引：57

作者：

ANDERSON, JR

BAKER, BG

机构：

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1962年 / 66卷 / 03期

关键词：

D O I：

10.1021/j100809a027

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

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页码：482 / &

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