HABITUATION TO ALKALI AND INCREASED UV-RESISTANCE IN DNA REPAIR-PROFICIENT AND REPAIR-DEFICIENT STRAINS OF ESCHERICHIA-COLI GROWN AT PH 9.0

被引:27
作者
GOODSON, M [1 ]
ROWBURY, RJ [1 ]
机构
[1] UNIV LONDON UNIV COLL,DEPT BIOL,GOWER ST,LONDON WC1E 6BT,ENGLAND
关键词
D O I
10.1111/j.1472-765X.1990.tb00139.x
中图分类号
Q81 [生物工程学(生物技术)]; Q93 [微生物学];
学科分类号
071005 ; 0836 ; 090102 ; 100705 ;
摘要
Repair‐deficient strains of Escherichia coli carrying polAI or recA mutations were more alkali‐sensitive than was their repair‐proficient parent but, like strain 1829 ColV, I‐K94, they showed habituation to alkali (induction of increased resistance) when grown at pH 9.0. Occurrence of such increased alkali resistance in the recA mutant implies that habituation to alkali does not depend on induction of SOS‐related repair mechanisms. Organisms of repair‐proficient and repair‐deficient strains also became more resistant to u.v.‐irradiation after growth at pH 9.0; this increased u.v.‐resistance also appeared to be RecA‐independent. Copyright © 1990, Wiley Blackwell. All rights reserved
引用
收藏
页码:123 / 125
页数:3
相关论文
共 4 条
[1]   HABITUATION TO ALKALI IN ESCHERICHIA-COLI [J].
GOODSON, M ;
ROWBURY, RJ .
LETTERS IN APPLIED MICROBIOLOGY, 1989, 9 (02) :71-73
[2]  
ROWBURY RJ, 1989, CHEM IND, V20, P685
[3]   INDUCTION OF SOS FUNCTIONS BY ALKALINE INTRACELLULAR PH IN ESCHERICHIA-COLI [J].
SCHULDINER, S ;
AGMON, V ;
BRANDSMA, J ;
COHEN, A ;
FRIEDMAN, E ;
PADAN, E .
JOURNAL OF BACTERIOLOGY, 1986, 168 (02) :936-939