A HIGH-RESOLUTION ELECTRON-MICROSCOPE STUDY OF A SIGMA = 9/[110] 14.06-DEGREES TILT BOUNDARY IN AU

被引：7

作者：

KRAKOW, W

机构：

[1] IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY 10598

来源：

ACTA METALLURGICA ET MATERIALIA | 1992年 / 40卷 / 05期

关键词：

D O I：

10.1016/0956-7151(92)90075-P

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A structure analysis of a SIGMA = 9/[110] 141.06-degrees tilt boundary in Au has been performed and found to be in agreement with atomistic computer models. This boundary is naturally occurring in a [110] Au thin film and is formed at the intersection of two microtwins each with a common [110] axis normal to the film plane.

引用

页码：977 / 982

页数：6

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