PHOTOEMISSION FROM ULTRATHIN METALLIC-FILMS - QUANTUM SIZE EFFECT, ELECTRON-SCATTERING, AND FILM STRUCTURE

被引：97

作者：

JALOCHOWSKI, M ^{[1
]}

KNOPPE, H ^{[1
]}

LILIENKAMP, G ^{[1
]}

BAUER, E ^{[1
]}

机构：

[1] TECH UNIV CLAUSTHAL, INST PHYS, W-3392 CLAUSTHAL ZELLERFELD, GERMANY

来源：

PHYSICAL REVIEW B | 1992年 / 46卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.46.4693

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The quantum-size-effect structure of ultrathin Pb and Pb-In alloy films on Si(111) surfaces is studied by photoemission spectroscopy in the thickness range from 0 to about 30 monolayers and analyzed, taking into account electron scattering and film structure, which is characterized by high-energy-reflection-electron diffraction.

引用

页码：4693 / 4701

页数：9

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